Comparison of infrared frequency selective surfaces fabricated by direct-write electron-beam and bilayer nanoimprint lithographies
نویسندگان
چکیده
We report on the fabrication of crossed-dipole resonant filters by direct-write electron-beam and nanoimprint lithographies. Such structures have been used as spectrally selective components at visible, microwave, and infrared wavelengths. Imprinting is accomplished in a modified commercial hot press at 155 °C. The replica is then etched in oxygen plasma and developed in chlorobenzene to selectively dissolve the poly~methylmethacrylate and methacrylic acid! and poly~methylmethacrylate! bilayer resist. This step enhances undercut and improves lift-off metalization. Infrared fourier transform spectroscopy was performed to characterize the transmission response of the frequency selective surfaces ~FSSs! fabricated. The resonant behavior for the direct-write FSS was found to be 5.3 mm and for the nanoimprinted FSS to be 6 mm. The shift towards longer wavelengths is consistent with the dimensions obtained for the FSSs elements in both cases. © 2000 American Vacuum Society. @S0734-211X~00!09206-4#
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